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October 2, 2018

Open Call | International TECHstyle Art Biennial, USA (Submission Fee)

Application deadline: 22 October.

In 2010, the San Jose Museum of Quilts and Textiles launched the International TECHstyle Art Biennial (ITAB). Returning now for its fourth incarnation, ITAB is a juried exhibition of work by artists merging fiber media with new information and communication technologies in their artistic processes, as a medium of artistic expression, and/or in the content of their work.

Leveraging its location in Silicon Valley, ITAB serves as the premiere platform for introducing the work of artists exploring the intersection of fiber and technology to a global community.

Fibers, textiles, and the language of textile patterning have achieved wide attention in contemporary art practice often as a means of evoking an experience that is both historical and contemporary. ITAB seeks to expose and explore the tensions between and among works by artists using fiber media whose work employs diverse artistic disciplines: architecture, fashion, fiber art, installation art, interior design, new media, painting, sculpture, etc. Artwork demonstrating a keen understanding and mastery of the aesthetic, structural/technical, and semiotic possibilities of fiber and of digital, computerized, or networked information and communication technologies are the hallmark of the San Jose Museum of Quilts & Textiles’ International TECHstyle Art Biennial.

Application 1. Artists may submit up to three (3) works. 2. Work will be submitted digitally to an online server, directions below. 3. Online submissions are open August 17- October 22, 2018. 4. The entry fee is $35 for San Jose Museum of Quilts & Textiles members, $45 for non-members. Only one entry fee per artist is required (includes up to three submissions). 5. Each submission must be represented by two images: One (1) full view and one (1) detail. NOTE: For installation pieces, please provide TWO (2) different views and TWO (2) details. 6. Work that will be exhibited in a frame should be represented as such. Work framed under glass should be photographed without glass, but noted that it will be displayed with glass.

For more information see: eucida.biennial-call-for-entries


Open Call | International TECHstyle Art Biennial, USA (Submission Fee)